“Meiden Nanoprocess Innovation Corporation Introduces Pure Ozone Generator & Surface Modification Coating System at Nano Tech 2024
Meiden Nanoprocess Innovation Corporation, a leading company in ozone research and development, showcased their highly concentrated pure ozone generator at this year’s Nano Tech exhibition. With over 20 years of experience in ozone technology, the company has established itself as a pioneer in the industry.
The pure ozone generator allows for the easy production of OH radicals by mixing ethylene gas and pure ozone. These radicals are then utilized for surface treatments, such as modification, flooding, and pre-treatment for bonding. This technology provides quick and damage-free treatments, making it ideal for applications in semiconductor surface treatment, bonding technology, and glass treatment.
Another remarkable feature of the pure ozone gas is its application in Atomic Layer Deposition (ALD) deposition. This method offers two advantages – low-temperature deposition and a wide range of applications. Meiden Nanoprocess Innovation Corporation’s ozone technology enables low-temperature film deposition in the range of room temperature to 150°C. Additionally, the pure ozone gas can penetrate deep into micro channels, facilitating high film growth with exceptional penetration. This makes it suitable for applications in semiconductors and low heat resistant base materials such as film and glass.
Overall, Meiden Nanoprocess Innovation Corporation’s pure ozone technology offers versatile and effective solutions for surface treatment and film deposition. Interested parties are encouraged to contact the company for further information.”Generated by OpenAI
local na rede Internet:https://www.meidensha.co.jp/npi/
